Sievers Boron Ultra Online UPW Analyzer
Continuous, online monitoring of boron down to single parts-per-trillion (ppt) levels
As semiconductor chips shrink and become more complex, the demand for high-quality ultrapure water (UPW) is critical. Even the slightest contamination can cause significant defects, making early detection of impurities essential in microelectronics manufacturing.
What’s at risk? Product yield, downstream processes, and unnecessary costs.
The Sievers Boron Ultra Analyzer provides continuous, unattended online monitoring of boron concentrations in UPW processes with parts-per-trillion (ppt) sensitivity. This supports compliance with primary and polish loop specifications and enables manufacturers to optimize the timing of ion exchange (IX) resin bed regeneration. Boron monitoring is the most proactive IX process control strategy and is far superior than silica or ionic contamination monitoring.
Online Performance & Process Optimization
The Sievers Boron Ultra Analyzer can significantly reduce operating expenses and maintain quality in UPW systems.
Boron Ultra detects an increase in boron prior to silica release, making it a critical tool to prevent the leakage of colloidal and ionic silica into ultrapure water. It is used to predict mixed-bed IX resin exhaustion, optimize electrodeionization (EDI) performance, and control primary and polish loop contamination levels.
Boron Ultra supports the International Roadmap for Devices and Systems (IRDS) 50 ppt boron limit in semiconductor UPW, supporting boron and silica contamination control.
The Sievers Boron Ultra was designed in cooperation with semiconductor manufacturers to meet the needs of facility managers, UPW system owners, and UPW process control engineers. Boron monitoring is the most proactive ion exchange process control strategy and is far superior than silica or ionic contamination monitoring.
- Parts-per-trillion (ppt) sensitivity
- 20 data points per hour
- Compliance with primary and polish loop specifications
- Optimization of ion exchange resin regeneration
- Silica and boron contamination control